Harland G. Tompkins's A User's Guide to Ellipsometry PDF

By Harland G. Tompkins

ISBN-10: 0126939500

ISBN-13: 9780126939507

This textual content on optics for graduate scholars explains the right way to make sure fabric houses and parameters for inaccessible substrates and unknown motion pictures in addition to find out how to degree super skinny movies. Its 14 case stories illustrate techniques and strengthen functions of ellipsometry — rather when it comes to the semiconductor and to stories related to corrosion and oxide growth.
A User's advisor to Ellipsometry will permit readers to maneuver past restricted turn-key purposes of ellipsometers. as well as its accomplished discussions of the size of movie thickness and optical constants in movie, it additionally considers the trajectories of the ellipsometric parameters Del and Psi and the way adjustments in fabrics impact parameters. This quantity additionally addresses using polysilicon, a cloth mostly hired within the microelectronics undefined, and the consequences of substrate roughness. 3 appendices supply beneficial references.

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Extra resources for A User's Guide to Ellipsometry

Example text

Is calculated from the measurement without the QWP. Making measurements in both configurations allows the resolving of the "±" sign for Δ as well as obtaining the most precise value. Figure 2-13 shows an example of a rotating element photometric instrument. 5 References 1. 2. 3. 4. 5. 6. 7. 8. 9. P. Drude, Wied. , 43,126 (1891). "Polarisation of Light," W. , London (1874). A. Rothen, Rev. Set. Instruments, 16, 26 (1945). ’’Theory of Optics,” P. , New York (1901), p. 258. "Semiconductor Material and Device Characterization," D.

4. F. L. McCrackin, E. Passaglia, R. R. Stromberg, and H. L. Steinberg, ]. Res. NBS A. Physics and Chemistry, 67A, 363 (1963). A. N. Saxena, ]. Opt. Soc. , 55,1061 (1965). F. L. McCrackin, Nat. Bur. Stand. Tech. Note 479 (1969). S. Chandrasekhar, A. S. Vengurlekar, S. K. Roy, and V. T. Karulkar, J. Appl. , 63, 2072 (1988). 1 Inaccessible Substrates and Unknown Films In Chapter 3, we discussed the Del/Psi trajectories for various kinds of films. From that discussion, it might appear that one simply measures Del and Psi and then determines by inspection the value of the thickness.

It is not simply a matter of measuring Del and Psi before the anneal since the anneal changes the grain structure and stoichiometry. Etching the oxide off and then measuring the values of 54 Inaccessible Substrates & Unknown Films Psi Figure 4-2. 2. Del and Psi has been used by others,7 but in the present case, the results were erratic and not dependable. We therefore will conjecture these values, using the information obtained from Auger electron spectros­ copy. After the values are determined, subsequent samples will not have to be analyzed with AES.

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A User's Guide to Ellipsometry by Harland G. Tompkins

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